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Solar Fuel Conversion: Facilities

Wang lab in ECE/UCSD: Wang lab is fully equipped with the nanowire synthesis, characterization, and photovoltaic device testing.
(i) Nanowire synthesis equipments, including (1) gas source low-pressure chemical vapor deposition (CVD) system for the highly-controlled growth of nanowires and nanowire heterostructures; (2) wet-chemical laboratory facilities (benches, hoods, glassware, etc.) required for processing and assembly of nanowire building blocks and chemical treatment of nanowire surfaces.
(ii) Electrical characterization of single and multiple nanwire or arrays - home-built computerized data acquisition (DAQ) station with source-measure unit and low noise current amplifier and HP 4145B semiconductor parameter analyzer for electrical current-voltage characterization.
(iii) Optical and optoelectronic characterization of nanowire devices (Horiba Jobin Yvon iHR550 monochromator.
(iv) Solar cell and PEC measurements: Newport 9600 solar simulator with enhanced UV light source, Digi-Ivy Potentiostat with electrodes, and home-built PEC sample holder and apparatus.

UCSD/Cal-IT2 NANO3 facilities: The Calit2’s Nano3 facility is a university facility and is designed for teaching and research and shared among users from UCSD and from industry. It is located right next to the ECE Department. The resources listed below are primarily housed within the Nano3 and the Engineering I building.

Extensive facilities exist at UCSD for advanced materials characterization include transmission electron microscopy, scanning electron microscopy, high- resolution x-ray diffraction systems, Hall effect measurement, low temperature photoluminescence, absorption spectroscopy, ultrahigh-vacuum scanning tunneling microscopy (STM) systems, ballistic electron emission microscopy, atomic force microscopy and related proximal probe techniques (electrostatic force microscopy, scanning capacitance microscopy, scanning Kelvin probe force microscopy, etc.), and various optical microscopes.

Nano3 has extensive state-of-the-art processing facilities including photolithography and electron beam lithography, dry and wet etching, and other processing, including thermal and electron-beam metal deposition, sputtering systems, furnaces for oxidation, diffusion, and annealing, rapid thermal annealing systems, and wafer bonding. In addition, plasma-enhanced chemical vapor deposition, reactive ion etching, reactive ion beam etching, plasma etching, etc. Nano3. We have recently installed a Nano Imprint Lithographic (NIL) system and Atomic Layer Deposition (ALD). We have been using the NIL and ALD in prior research and will continue to use ALD in the proposed research for the conformal coating of thin layer of oxides.
TEM/STEM is available at the Calit2’s facility at UC Irvine (, and UCSD Chemistry department ( as user fee facilities.